It is used to evaluate and visualize simulation results or experimental data, for example, obtained by critical dimension (CD) metrology measurements. Sentaurus Lithography PWA is a comprehensive and powerful tool for process window analysis. Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC layout patterns. Proteus ILT uses inverse imaging technology to resolve the most challenging optical proximity effects encountered on dense designs at leading technology nodes. Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline Technology. ![]() Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns. A powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases.
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